HCID 23567177, 화합물 → HCID 20766018, 화합물

반응식

[CH3:1][O:2][C:3]([CH:5]1[CH2:14][CH2:13][C:12]2[C:7](=[CH:8][CH:9]=[C:10]([S:15](Cl)(=O)=O)[CH:11]=2)[O:6]1)=[O:4].COC(C1C=CC2C=C(SCC3SC(C4C=CC(C(F)(F)F)=CC=4)=NC=3C)C=CC=2O1)=O>>[CH3:1][O:2][C:3]([CH:5]1[CH2:14][CH2:13][C:12]2[C:7](=[CH:8][CH:9]=[C:10]([SH:15])[CH:11]=2)[O:6]1)=[O:4]

참가 물질

반응물 2

HCID 23567177HCID 23567177, 화합물

HCID 69590777HCID 69590777, 화합물2회

생성물 1

HCID 20766018HCID 20766018, 화합물

실험 절차

Compound 3C was prepared according to the method of Example 1 utilizing compound 3B. Compound 3C was prepared in 67% yield. MS: 223 (M−1)+. Preparation of 6-[4-Methyl-2-(4-trifluoromethyl-phenyl)-thiazol-5-ylmethylsulfanyl]-1-benzopyran-2-carboxylic acid methyl ester (Compound 3D)

후처리

customCompound 3C was prepared

출처 및 근거

ORD 기록: ord-ce1a4aca93ac45f6b5040c6468e73246
출처 데이터셋: uspto-grants-2005_03
DOI: 10.6084/m9.figshare.5104873.v1
특허 번호: US06867224B2

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