HuagongsheHuagongshe Chemistry Print Report · For research reference only
Heptanoic acid, 2-phenyl-, 3-(diethylamino)propyl ester, hydrochloride → N-Ethyl-o-toluenesulfonamide
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Heptanoic acid, 2-phenyl-, 3-(diethylamino)propyl ester, hydrochloride | HCID 54153 | — |
| Reactant | 2-Methylbuta-1,3-diene;styrene | HCID 159989 | — |
| Reactant | 2-Butenedioic acid (2E)-, 1,4-dioctyl ester | HCID 5462693 | — |
| Reactant | HCID 22253865 | HCID 22253865 | — |
| Reactant | Sodium dodecylbenzene sulphonate | HCID 57371080 | — |
| Product | N-Ethyl-o-toluenesulfonamide | HCID 14110 | — |
| Product | HCID 69861713 | HCID 69861713 | — |
Reaction Steps
49.5 g of the sulfonic acid group-containing polyurethane was kneaded, in a nitrogen atmosphere at 150° C. using a pressure kneader, with 20 g of a styrene-isoprene block copolymer (Cariflex TR 1107, a product of Shell Chemical Ltd.), 2 g of sodium laurylbenzenesulfonate, 5 g of a polybutadiene diacrylate (BAC-45, a product of Osaka Organic Chemical Ind. Ltd.), 1 g of an aliphatic diacrylate (C-2000, a product of THERTOMER), 2 g of dioctyl fumarate, 2 g of 2,2- dimethoxyphenylacetophenone, 10 g of a maleinized polybutadiene (ME-1000-80, a product of Nippon Petrochemical Co., Ltd.), 7.5 g of N-ethyltoluenesulfonamide and 0.1 g of 2,2-di-t-butyl-p-cresol, thereby forming a uniform transparent photosensitive resin composition.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06479215B2 |
| Source dataset | uspto-grants-2002_11 |
| ORD ID | ord-0ef210e523ca4d8791c6852f2bbc9b82 |
| Source note | uspto-grants-2002_11 |