HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 67079154, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | HCID 523407 | HCID 523407 | — |
| Reactant | HCID 67079339 | HCID 67079339 | — |
| Reactant | Butyllithium | HCID 178418339 | — |
| Solvent | Hexane | HCID 8058 | — |
| Solvent | Triethylamine | HCID 8471 | — |
| Product | HCID 67079154 | HCID 67079154 | — |
Reaction Steps
According to the procedure of Example 1, Step 3, 2,4-dibromo-1-(1-methoxy-1-methylethoxymethyl)benzene was treated with n-butyllithium in hexane, 3,4,5-tris(trimethylsilyloxy)-6-trimethylsilyloxymethyl-tetrahydropyran-2-one, triethylamine, and trimethylsilyl chloride. The reaction mixture was subjected to workup procedure, and the resulting residue was purified by HPLC (column; Inertsil ODS-3, 20 mm I.D.×250 mm; acetonitrile, 30 mL/min) to give the titled compound as two isolated diastereomers.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US08569520B2 |
| Source dataset | uspto-grants-2013_10 |
| ORD ID | ord-56506499ed5545ff9c36c891cafce693 |
| Source note | uspto-grants-2013_10 |