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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1047405Generated: October 31, 2026

Chlorotrimethylsilane → HCID 67079154, compound

https://huagongshe.com/reaction/1047405

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantHCID 523407HCID 523407—
ReactantHCID 67079339HCID 67079339—
ReactantButyllithiumHCID 178418339—
SolventHexaneHCID 8058—
SolventTriethylamineHCID 8471—
ProductHCID 67079154HCID 67079154—

Reaction Steps

According to the procedure of Example 1, Step 3, 2,4-dibromo-1-(1-methoxy-1-methylethoxymethyl)benzene was treated with n-butyllithium in hexane, 3,4,5-tris(trimethylsilyloxy)-6-trimethylsilyloxymethyl-tetrahydropyran-2-one, triethylamine, and trimethylsilyl chloride. The reaction mixture was subjected to workup procedure, and the resulting residue was purified by HPLC (column; Inertsil ODS-3, 20 mm I.D.×250 mm; acetonitrile, 30 mL/min) to give the titled compound as two isolated diastereomers.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08569520B2
Source datasetuspto-grants-2013_10
ORD IDord-56506499ed5545ff9c36c891cafce693
Source noteuspto-grants-2013_10