Trifluoroacetic acid → 2-(2-amino-3-(tert-butylamino)quinoxalin-5-yl)-6,7-dihydro-1H-pyrrolo[3,2-c]pyridin-4(5H)-one
반응식
[C:1]([NH:5][C:6]1[C:7]([NH:26]CC2C=CC(OC)=CC=2OC)=[N:8][C:9]2[C:14]([N:15]=1)=[C:13]([C:16]1[NH:24][C:23]3[CH2:22][CH2:21][NH:20][C:19](=[O:25])[C:18]=3[CH:17]=1)[CH:12]=[CH:11][CH:10]=2)([CH3:4])([CH3:3])[CH3:2].C(O)(C(F)(F)F)=O>C(Cl)Cl>[NH2:26][C:7]1[C:6]([NH:5][C:1]([CH3:4])([CH3:3])[CH3:2])=[N:15][C:14]2[C:9](=[CH:10][CH:11]=[CH:12][C:13]=2[C:16]2[NH:24][C:23]3[CH2:22][CH2:21][NH:20][C:19](=[O:25])[C:18]=3[CH:17]=2)[N:8]=1참가 물질
반응물 2
생성물 1
시약·촉매·용매 1
반응 조건
- 온도
- 40 °C
실험 절차
A solution of 2-(3-(tert-butylamino)-2-((2,4-dimethoxybenzyl)amino)quinoxalin-5-yl)-6,7-dihydro-1H-pyrrolo[3,2-c]pyridin-4(5H)-one (304d) (40 mg, 0.08 mmol) and TFA (1.0 mL, 12.98 mmol) in DCM (1.0 mL) was stirred at 25° C. for 1 h. The reaction mixture was subsequently heated at 40° C. for 1 h. The reaction mixture was then concentrated in vacuo, and the residue was partitioned between EtOAc (50 mL) and saturated aq. NaHCO3 (30 mL). The organic layer was separated, washed with brine (20 mL), dried over Na2SO4, filtered, and concentrated in vacuo. Chromatographic purification of the residue (silica gel, 0-10% MeOH/DCM) furnished 2-(2-amino-3-(tert-butylamino)quinoxalin-5-yl)-6,7-dihydro-1H-pyrrolo[3,2-c]pyridin-4(5H)-one (6.4 mg, 0.018 mmol, 23% yield) as a light-yellow solid: 1H NMR (400 MHz, DMSO-d6) δ ppm 12.12 (1H, br. s.), 7.53 (1H, dd, J=7.0, 1.8 Hz), 7.19-7.22 (1H, m), 7.14-7.19 (1H, m), 6.92 (1H, br. s.), 6.90 (1H, d, J=2.0 Hz), 6.86 (2H, s), 6.33 (1H, s), 3.43 (2H, td, J=6.9, 2.2 Hz), 2.86 (2H, t, J=6.7 Hz), 1.56 (9H, s). m/z (ESI, +ve) 351.2 (M+H)+.
후처리
- concentrationThe reaction mixture was then concentrated in vacuo
- customthe residue was partitioned between EtOAc (50 mL) and saturated aq. NaHCO3 (30 mL)
- customThe organic layer was separated
- washwashed with brine (20 mL)
- dry with materialdried over Na2SO4
- filtrationfiltered
- concentrationconcentrated in vacuo
- customChromatographic purification of the residue (silica gel, 0-10% MeOH/DCM)
출처 및 근거
- ORD 기록
- ord-6e21817f113e42f99682983fa142488c
- 출처 데이터셋
- uspto-grants-2016_07
- 특허 번호
- US09394297B2
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