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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1065139Generated: October 31, 2026

Chlorotrimethylsilane → HCID 20541498, compound

https://huagongshe.com/reaction/1065139

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantAmmonium ChlorideHCID 25517—
Reactant2,6,6-Trimethylcyclohexa-2,4-dienoneHCID 83528—
ReactantPotassium FluorideHCID 522689—
ReactantHCID 12749247HCID 12749247—
ReactantCID 53628100HCID 178418400—
SolventMethanolHCID 887—
SolventTetrahydrofuranHCID 8028—
SolventCyclohexaneHCID 8078—
SolventHexamethylphosphoramideHCID 12679—
ProductHCID 20541498HCID 2054149856%

Reaction Steps

To a solution of 400 mg 3-trimethylsilyloxy-1,4-pentadiene in 3 ml of tetrahydrofuran at -78° under argon was added a solution of 2.3 ml of sec-butyllithium in cyclohexane and the solution stirred for 15 minutes. Then, a solution of 275 mg. of 2,6,6-trimethylcyclohexa-2,4-dienone in 1 ml of tetrahydrofuran was added. After 5 minutes, 332 mg of trimethylsilyl chloride in 2 ml of hexamethylphosphoric acid triamide was added and the mixture left for 1 hour at -78°. After working up as in Example 1(a) the crude product mixture was diluted with 20 ml of methanol cooled to 0° and 224 mg of potassium fluoride were added. After 1 hour at 0°-5°, the mixture was poured into saturated aqueous NH4Cl solution and extracted with ether. Chromatography (SiO2, toluene) of the evaporated extract gave 329 mg of 1-[3-oxo-pent-4 -en-1-yl]-1-trimethylsilyloxy-2,6,6-trimethylcyclohexa-2,4-diene (56% yield) characteristics as above.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS04328352
Source datasetuspto-grants-1982_05
ORD IDord-86396ca99fec4357bf0fe636247c1156
Source noteuspto-grants-1982_05