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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1077394Generated: October 31, 2026

3-(Trimethoxysilyl)propyl methacrylate → 3-(Trimethoxysilyl)propyl methacrylate

https://huagongshe.com/reaction/1077394

Reaction equation

Participants

RoleNameHCIDCharge
Reactant3-(Trimethoxysilyl)propyl methacrylateHCID 17318—
SolventIsopropanolHCID 3776—
Product3-(Trimethoxysilyl)propyl methacrylateHCID 17318—
ProductSilaneHCID 23953—

Reaction Steps

As shown in FIG. 2(a), a soda glass plate which was 25 by 25 cm square and 1.35 mm thick was used as a substrate 3, and the surface of the substrate 3 was treated with γ-methacryloxypropyl trimethoxy silane (KBM503, manufactured by Shinetsu Silicone K.K.). For this purpose, first, KBM503 was dissolved in isopropyl alcohol under stirring for 1 hour to obtain a 0.5 wt % solution. With 6 to 8 ml of the solution being dropped on the glass substrate 3, spin coating was carried out at 300 rpm for the first 5 seconds and then at 500 rpm for the following 15 seconds. Then, baking was carried out for 30 minutes at 120° C. to make the glass substrate 3 and the KBM 503 adhere to each other, thereby forming a silane coupling agent layer 5 on the substrate 3, as shown in FIG. 2(b).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05543228
Source datasetuspto-grants-1996_08
ORD IDord-9b01be2e56ea41dea15e7a6224454e06
Source noteuspto-grants-1996_08