HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoromethane → Chf3 CF4
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoromethane | HCID 6373 | — |
| Reactant | Carbon tetrafluoride | HCID 6393 | — |
| Product | Chf3 CF4 | HCID 88450547 | — |
Reaction Steps
SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US08137569B2 |
| Source dataset | uspto-grants-2012_03 |
| ORD ID | ord-237bd32383524a8aa3a3e8229d4feb84 |
| Source note | uspto-grants-2012_03 |