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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1095207Generated: October 26, 2026

Trifluoromethane → Chf3 CF4

https://huagongshe.com/reaction/1095207

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoromethaneHCID 6373—
ReactantCarbon tetrafluorideHCID 6393—
ProductChf3 CF4HCID 88450547—

Reaction Steps

SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08137569B2
Source datasetuspto-grants-2012_03
ORD IDord-237bd32383524a8aa3a3e8229d4feb84
Source noteuspto-grants-2012_03