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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1099303Generated: November 1, 2026

Trifluoroacetic acid → HCID 59232142, compound

https://huagongshe.com/reaction/1099303

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantEthyl AcetateHCID 8857—
ReactantHCID 59232010HCID 59232010—
Solvent1,2-DichloroethaneHCID 11—
ProductHCID 59232142HCID 5923214242.1%

Reaction Steps

A suspension of Example 274 (498 mg, 0.77 mmol) in 10 mL 1,2-dichloroethane was treated with 3 mL TFA at rt. The reaction quickly became homogeneous and at 10 min no starting material remained by RP-HPLC. The reaction mixture was concentrated in vacuo, and the residue taken up again in fresh 1,2-dichloroethane and concentrated again; this was repeated 2 times. The residue was taken up in THF (5 mL) and EtOAc (35 mL) and washed with aq. sodium carbonate. The organic layer was dried with sodium sulfate and concentrated in vacuo to provide a tan solid. Trituration with ethyl acetate provided the title compound (178 mg, 42%) as a tan solid. Concentration of the mother liquor provided an additional the title compound (201 mg, 48 mmol) of similar purity. 1H-NMR (DMSO-d6) δ 9.54 (bs, 2H), 8.70 (dd, 1H), 8.21 (dd, 1H), 7.96 (s, 1H), 7.60 (dd, 1H), 7.30-7.46 (m, 1H), 7.38 (dd, 1H), 6.57 (s, 1H), 3.16-3.31 (m, 1H), 3.02-3.12 (m, 2H), 2.60-2.74 (m, 2H), 1.89-2.02 (m, 2H), 1.60 (ddd, 2H), 1.42 (s, 9H); MS [M+H]+=550.2; LCMS RT=2.43

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08143393B2
Source datasetuspto-grants-2012_03
ORD IDord-b80d65abf5b642a0acd949b033408104
Source noteuspto-grants-2012_03