HuagongsheHuagongshe Chemistry Print Report · For research reference only
Nitric Acid → HCID 9975520, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Nitric Acid | HCID 944 | — |
| Reactant | HCID 10358081 | HCID 10358081 | — |
| Solvent | Chloroform | HCID 6212 | — |
| Solvent | Trifluoroacetic acid | HCID 6422 | — |
| Product | HCID 9975520 | HCID 9975520 | — |
Reaction Steps
The product from Example 21 (31 g) was dissolved in trifluoroacetic acid (450 mL). The solution was treated dropwise with 33 mL of fuming 90% nitric acid and stirred at room temperature. The reaction mixture was concentrated, the residue was dissolved in chloroform and then washed well with sodium bicarbonate solution. A solid formed, and was dissolved in 3 L chloroform and dried over magnesium sulfate. After evaporation, the residue was crystallized from ethyl acetate to give a white solid (19.32 g), and the filtrate concentrated to give an additional 16.3 g.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06057313 |
| Source dataset | uspto-grants-2000_05 |
| ORD ID | ord-27bd6f2ba32348e0aa79d4e12d950fe5 |
| Source note | uspto-grants-2000_05 |