HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 59557685, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | Lithium diisopropylamide | HCID 2724682 | — |
| Reactant | HCID 59557720 | HCID 59557720 | — |
| Solvent | Water | HCID 962 | — |
| Product | HCID 59557685 | HCID 59557685 | 63.3% |
Reaction Steps
To a cooled solution (−78° C.) of 1-bromo-2-((but-3-ynyloxy)methyl)-4-chloro-5-(4-ethylbenzyl)benzene (BT) (96 mg, 0.245 mmol) was added LDA (2M in THF, 0.18 mL, 0.36 mmol). After stirring for 20 min, TMS-Cl (50 μL, 0.393 mmol) was added. After stirring for another 2.5 h, additional TMS-Cl (30 μL, 0.236 mmol) was added. The reaction solution was stirred at −78° C. for 70 min and then warmed to room temperature with stirring for 1.5 h. Water was added and the mixture was extracted with ethyl acetate and the extracts were washed with brine, and dried over Na2SO4. The solution was concentrated and the resulting residue was purified by preparative TLC to afford 72 mg of title product.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US07838498B2 |
| Source dataset | uspto-grants-2010_11 |
| ORD ID | ord-3de362baf4cb41a3a675bfe71a959578 |
| Source note | uspto-grants-2010_11 |