HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trichlorosilane → Phenyltrichlorosilane
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trichlorosilane | HCID 24811 | — |
| Reactant | Phenyltrimethylsilane | HCID 69849 | — |
| Product | Phenyltrichlorosilane | HCID 7372 | — |
| Product | Trimethylsilane | HCID 70435 | — |
Reaction Steps
Eaborn et al., J. Organometal. Chem. 4:489 (1965), describes a process where phenyltrimethylsilane and trichlorosilane are reacted at 500° C. in the gas phase to give phenyltrichlorosilane and trimethylsilane.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US05110974 |
| Source dataset | uspto-grants-1992_05 |
| ORD ID | ord-6b27836cb44444fa92c209befd1d6359 |
| Source note | uspto-grants-1992_05 |