Methanesulfonyl chloride → HCID 86636652, compound

HRID 1361328Notes

Reaction equation

HRID 1361328 reaction equation
[C:1]([N:8]1[CH2:12][CH2:11][C@H:10]([N:13]([CH:21]2[CH2:26][CH2:25][C:24]([CH3:28])([CH3:27])[CH2:23][CH2:22]2)[C:14](=[O:20])[C:15]([CH3:19])([CH3:18])[CH2:16][OH:17])[CH2:9]1)([O:3][C:4]([CH3:7])([CH3:6])[CH3:5])=[O:2].[CH3:29][S:30](Cl)(=[O:32])=[O:31]>C(Cl)Cl>[C:1]([N:8]1[CH2:12][CH2:11][C@H:10]([N:13]([CH:21]2[CH2:26][CH2:25][C:24]([CH3:28])([CH3:27])[CH2:23][CH2:22]2)[C:14](=[O:20])[C:15]([CH3:19])([CH3:18])[CH2:16][O:17][S:30]([CH3:29])(=[O:32])=[O:31])[CH2:9]1)([O:3][C:4]([CH3:5])([CH3:6])[CH3:7])=[O:2]

Participants

4

Reactant 2

HCID 31297Methanesulfonyl chlorideHCID 66971267HCID 66971267, compound

Product 1

HCID 86636652HCID 86636652, compoundYield 75%

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

To a solution of (3S)-1-Boc-3-[(4,4-dimethylcyclohexyl)(3-hydroxy-2,2-dimethylpropanoyl)amino]pyrrolidine (300 mg, 0.76 mmol) prepared in Step B of Example A8 in DCM was added TEA (192 mg, 1.9 mmol), slowly added dropwise methanesulfonylchloride (104 mg, 0.91 mmol) at 0° C., and the solution was heated to rt, and stirred for 1 h. After the reaction finished, the solvent was concentrated in vacuo, and washed with water and EtOAc. The organic layer was dried over MgSO4, concentrated in vacuo, and purified by column chromatography (eluent: EtOAc/Hex=1/2) to give (3S)-1-Boc-3-[(4,4-dimethylcyclohexyl){2,2-dimethyl-3-[(methylsulfonyl)oxy]propanoyl}amino]pyrrolidine (250 mg, 75%). A solution of this compound (200 mg, 0.42 mmol) in THF was added dropwise TBAF (in THF, 1.0M 0.5 ml, 0.5 mmol), and the solution was stirred at 80° C. for 3 h. After the reaction finished, the solvent was concentrated in vacuo, and extracted with 1N-HCl and EtOAc. The organic layer was dried over MgSO4, concentrated in vacuo, and purified by column chromatography (eluent: EtOAc/Hex=1/4) to give the title compound (147 mg, 89%).

Workup

  1. concentrationthe solvent was concentrated in vacuo
  2. washwashed with water and EtOAc
  3. dry with materialThe organic layer was dried over MgSO4
  4. concentrationconcentrated in vacuo
  5. custompurified by column chromatography (eluent: EtOAc/Hex=1/2)

Sources & evidence

ORD record
ord-5d7a6396350f4207a2d1a0831953d29b
Source dataset
uspto-grants-2011_02
Patent number
US07879852B2

Reaction notes

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