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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1376939Generated: October 30, 2026

Chlorotrimethylsilane → HCID 22918080, compound

https://huagongshe.com/reaction/1376939

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantCyclotetrasilane, octaphenyl-HCID 70595—
ReactantSodium BicarbonateHCID 516892—
ReactantHCID 178506967HCID 178506967—
SolventTetrahydrofuranHCID 8028—
SolventHexaneHCID 8058—
ProductHCID 22918080HCID 2291808032%

Reaction Conditions

Temperature0 °C

Reaction Steps

In an argon atmosphere, to a tetrahydrofuran solution (9 ml) of 109 mg (0.15 mmol) of octaphenylcyclotetrasilane was added 0.56 ml (0.15 mmol) of a tetrahydrofuran solution (0.27M) of phenyldimethylsilyllithium, and stirred at 0° C. for 15 minutes. Trimethylchlorosilane in an amount of 108 mg (1.0 mmol) was added, and reacted at room temperature for 3 hours. Hexane (2 ml) and saturated aqueous sodium bicarbonate solution (2 ml) were added, stirred, the hexane layer was separated, and dried with magnesium sulfate. The resulting crude product was purified by a silica gel column chromatography (hexane) to give 45 mg (32% yield) of 1,1,6,6,6-pentamethyl-1,2,2,3,3,4,4,5,5-nonaphenylhexasilane (3).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05663271
Source datasetuspto-grants-1997_09
ORD IDord-83e66fac879549a89e5d75e5231e22b6
Source noteuspto-grants-1997_09