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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1376940Generated: October 30, 2026

Chlorotrimethylsilane → HCID 22918074, compound

https://huagongshe.com/reaction/1376940

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantSodium BicarbonateHCID 516892—
ReactantCyclotetrasilane, octaethyl-HCID 529608—
ReactantHCID 178506965HCID 178506965—
SolventTetrahydrofuranHCID 8028—
SolventHexaneHCID 8058—
ProductHCID 22918074HCID 2291807441%

Reaction Conditions

Temperature0 °C

Reaction Steps

In an argon atmosphere, to a tetrahydrofuran solution (1 ml) of 52 mg (0.15 mmol) of octaethylcyclotetrasilane was added 0.75 ml (0.15 mmol) of a tetrahydrofuran solution (0.20M) of triphenylsilyllithium, and stirred at 0° C. for 15 minutes. Trimethylchlorosilane in an amount of 108 mg (1.0 mmol) was added, and reacted at room temperature for 3 hours. Hexane (2 ml) and saturated aqueous sodium bicarbonate solution (2 ml) were added, stirred, the hexane layer was separated, and dried with magnesium sulfate. The resulting crude product was purified by a silica gel column chromatography (hexane) to give 42 mg (41% yield) of 2,2,3,3,4,4,5,5-octaethyl-1,1,1-trimethyl-6,6,6-triphenylhexasilane (4).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05663271
Source datasetuspto-grants-1997_09
ORD IDord-4368405b460f4b7e94a3be6ca2271b49
Source noteuspto-grants-1997_09