HuagongsheHuagongshe Chemistry Print Report · For research reference only
Formaldehyde → Naphthalene
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Formaldehyde | HCID 712 | — |
| Reactant | Oxalic Acid | HCID 971 | — |
| Reactant | Phenol | HCID 996 | — |
| Reactant | 1-Naphthaldehyde | HCID 6195 | — |
| Catalyst | p-Toluenesulfonic acid | HCID 6101 | — |
| Product | Naphthalene | HCID 931 | — |
Reaction Steps
One hundred parts of naphthalene-formaldehyde resin and 100 parts of phenol were reacted for 2 hours at 140° C. using 0.1 parts of p-toluenesulfonic acid as a catalyst. Then, 1 part of oxalic acid and 35 parts of 37% formalin were added, and the mixture was reacted for 2.5 hours at 100° C. Then, the reaction mixture was dehydrated under reduced pressure with heating. When the temperature reached 165° C., dehydration under reduced pressure was completed to obtain a naphthalene resin modified novolak-phenolic resin having a melting point of 125° C.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US05670231 |
| Source dataset | uspto-grants-1997_09 |
| ORD ID | ord-80cb80d49d634c0ab139c7d2686fb39f |
| Source note | uspto-grants-1997_09 |