HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1400857Generated: November 2, 2026
Trifluoroacetic acid → HCID 53491470, compound
https://huagongshe.com/reaction/1400857
Participants
| Role | Name | HCID | Charge |
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| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 67442432 | HCID 67442432 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 53491470 | HCID 53491470 | 87% |
Reaction Steps
Compound 182 (0.17 g, 0.26 mmol) was suspended in dichloromethane (50 mL) and TFA (1 mL) was added. This solution was stirred for 1 h then the mixture was concentrated. The residue was partitioned between ethyl acetate and water, washed with 3M NaOH and brine, then dried over anhydrous MgSO4, filtered and concentrated. The residue was triturated with diethyl ether and dried in vacuo to afford title compound 183 (0.125 g, 87% yield). 1H NMR (400 MHz, DMSO-d6) δ (ppm): 9.74 (s, 1H); 9.33 (s, 1H); 8.52 (d, J=5.5, 1H): 8.51-8.50 (m, 1H); 8.29 (s, 1H); 8.18 (d, J=8.0, 1H): 7.81 (dd, J=8.2, 2.2, 1H); 7.74 (J=12.9, 2.5, 1H); 7.46 (t. J=9.0, 1H); 7.30-7.27 (m, 1H); 6.66 (d, J=5.5, 1H); 6.55 (s, 1H); 3.37 (t, J=5.7, 2H); 3.22 (s, 1H); 2.82-2.75 (m, 4H); 2.68 (t, J=5.5, 2H); 2.37 (s, 3H). LRMS (M+H): 563.5.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US08906852B2 |
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| Source dataset | uspto-grants-2014_12 |
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| ORD ID | ord-7ab32738fb5a4b71b07ff727b91c7e89 |
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| Source note | uspto-grants-2014_12 |
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