Back
HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1424701Generated: October 31, 2026

Chlorotrimethylsilane → HCID 86668734, compound

https://huagongshe.com/reaction/1424701

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantDiisopropylamineHCID 7912—
Reactant(E)-3-Nonen-2-oneHCID 5317045—
ReactantButyllithiumHCID 178418339—
SolventTetrahydrofuranHCID 8028—
SolventHexaneHCID 8058—
ProductHCID 86668734HCID 8666873474%

Reaction Steps

Pursuant to Dienylester Formation Protocol I, diisopropylamine (7.0 mL, 50.0 mmol, 1.4 eq) and n-butyllithium (32.4 mL, 46.5 mmol, 1.3 eq, 1.44 M in hexane) in THF (33 mL) were reacted with a solution of (E)-non-3-en-2-one (5.9 mL, 35.6 mmol, 1.0 eq) in THF (10 mL) and trimethylsilylchloride (8.0 mL, 62.6 mmol, 1.8 eq) in THF (30 mL). For the silylenolether, no aqueous workup was undertaken. n-Hexane (100 mL) was added to the reaction mixture, the residue filtered off and the solvent evaporated. The raw product was purified by distillation to yield 5.54 g (26.1 mmol, 74%) of (E)-trimethyl(nona-1,3-dien-2-yloxy)silane as a colorless oil.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08927750B2
Source datasetuspto-grants-2015_01
ORD IDord-e6e3e150ee014a8c98e53636ca73036c
Source noteuspto-grants-2015_01