HRID1443337

反应详情

EQUATION

反应方程式

HRID 1443337 的结构方程式

AUXILIARIES

试剂、催化剂与溶剂

2

PROCEDURE

实验过程

To a solution of resorcinol (5.0 g, 45.4 mmol, 1 eq) in diethyl ether (30 mL) was added 3M EtMgBr (18.5 mL, 50.0 mmol, 1.1 eq)) dropwise under argon. The reaction mixture was stirred at rt for 20 min. The ether was removed under vacuum and anhydrous toluene (80 mL) was added. A solution of oxalyl chloride (4.36 mL, 50 mmol, 1.1 eq) in toluene (20 mL) was added to the mixture dropwise under argon. The reaction mixture was stirred at rt for 15 h. Anhydrous ethanol (40 mL) was added to the mixture and the reaction mixture was stirred at rt for 1 h. Most of the solvent was evaporated and then EtOAc (60 mL) and water (40 mL) were added to the mixture. The layer was separated and the organic layer was washed with water (2×40 mL), dried over Na2SO4, filtrated, and concentrated under reduced pressure. The residue was purified by column chromatography eluted with 20% EtOAc/hexane then 50% EtOAc/hexane solution to afford white solid (5.88 g, 62%) as product. 1H-NMR (CD3CN): δ 7.62(d, J=9.0 Hz, 1H), 6.50 (dd, J=2.3, 9.0 Hz, 1H), 6.41 (d, J=2.3 Hz, 1H), 4.44 (q, 2H), 1.40 (t, 3H).

WORKUP

后处理

  1. customThe ether was removed under vacuum and anhydrous toluene (80 mL)
  2. additionwas added
  3. stirringThe reaction mixture was stirred at rt for 15 h
  4. stirringthe reaction mixture was stirred at rt for 1 h
  5. customMost of the solvent was evaporated
  6. additionEtOAc (60 mL) and water (40 mL) were added to the mixture
  7. customThe layer was separated
  8. washthe organic layer was washed with water (2×40 mL)
  9. dry with materialdried over Na2SO4
  10. filtrationfiltrated
  11. concentrationconcentrated under reduced pressure
  12. customThe residue was purified by column chromatography
  13. washeluted with 20% EtOAc/hexane