HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 178521270, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | Anisole | HCID 7519 | — |
| Reactant | HCID 178491620 | HCID 178491620 | — |
| Product | HCID 178521270 | HCID 178521270 | 102.8% |
Reaction Steps
To a mixed solvent of trifluoroacetic acid (15 ml) and anisole (15 ml) is added 5-mercapto-1H-tetrazole-1-acetohydroxamic acid p-methoxybenzyl ester (3 g), and the mixture is stirred at room temperature for 2 hours under nitrogen gas. The reaction mixture is concentrated under reduced pressure, and the resultant material is dissolved in water and passed through a column of synthetic resin adsorbent (Diaion HP-20 distributed by Mitsubishi Chemical K.K.) (95 ml). The resin is washed with water. The fractions containing the main product are combined and concentrated under reduced pressure. The resultant solid is crystallized from a mixture of ether and hexane to give the title compound (1.83 g). mp. 105°-107° C.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US04555578 |
| Source dataset | uspto-grants-1985_11 |
| ORD ID | ord-cecea1614b3c4484b5631d323a74f4cb |
| Source note | uspto-grants-1985_11 |