HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1596699Generated: October 25, 2026
Chlorotrimethylsilane → N-allyl-3-trimethylsilylpropiolic amide
https://huagongshe.com/reaction/1596699
Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | Diethoxymethane | HCID 10024 | — |
| Reactant | Allyl isocyanate | HCID 15123 | — |
| Reactant | Trimethylsilylacetylene | HCID 66111 | — |
| Reactant | Lithium diisopropylamide | HCID 2724682 | — |
| Reactant | Butyllithium | HCID 178418339 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Solvent | tert-Butyl methyl ether | HCID 15413 | — |
| Product | N-allyl-3-trimethylsilylpropiolic amide | HCID 11217610 | — |
Reaction Steps
The reaction is carried out by dissolving trimethylsilylacetylene in an solvent. Preferred solvents include ethereals such as THF, diethoxymethane and t-butylmethyl ether. At about 0° C., a strong base is added dropwise over a period of about 15 minutes. Examples of strong bases are n-butyl lithium and lithium diisopropyl amide. While still maintaining the temperature near 0° C., a solution of allyl isocyanate in solvent is added dropwise over about 15 minutes. This is followed by the dropwise addition of trimethylsilyl chloride. After holding the reaction mixture at about 0 to about 10° C. for about 3 hours, the reaction is quenched with aqueous ammonium chloride and extracted with dichloromethane. The solvent is evaporated to yield the product, N-allyl-3-trimethylsilylpropiolic amide.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|
| Patent number | US06291513B1 |
|---|
| Source dataset | uspto-grants-2001_09 |
|---|
| ORD ID | ord-a31367e9ef604a1bad0292483a4caf64 |
|---|
| Source note | uspto-grants-2001_09 |
|---|