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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1596699Generated: October 25, 2026

Chlorotrimethylsilane → N-allyl-3-trimethylsilylpropiolic amide

https://huagongshe.com/reaction/1596699

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantDiethoxymethaneHCID 10024—
ReactantAllyl isocyanateHCID 15123—
ReactantTrimethylsilylacetyleneHCID 66111—
ReactantLithium diisopropylamideHCID 2724682—
ReactantButyllithiumHCID 178418339—
SolventTetrahydrofuranHCID 8028—
Solventtert-Butyl methyl etherHCID 15413—
ProductN-allyl-3-trimethylsilylpropiolic amideHCID 11217610—

Reaction Conditions

Temperature0 °C

Reaction Steps

The reaction is carried out by dissolving trimethylsilylacetylene in an solvent. Preferred solvents include ethereals such as THF, diethoxymethane and t-butylmethyl ether. At about 0° C., a strong base is added dropwise over a period of about 15 minutes. Examples of strong bases are n-butyl lithium and lithium diisopropyl amide. While still maintaining the temperature near 0° C., a solution of allyl isocyanate in solvent is added dropwise over about 15 minutes. This is followed by the dropwise addition of trimethylsilyl chloride. After holding the reaction mixture at about 0 to about 10° C. for about 3 hours, the reaction is quenched with aqueous ammonium chloride and extracted with dichloromethane. The solvent is evaporated to yield the product, N-allyl-3-trimethylsilylpropiolic amide.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06291513B1
Source datasetuspto-grants-2001_09
ORD IDord-a31367e9ef604a1bad0292483a4caf64
Source noteuspto-grants-2001_09