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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1615052Generated: October 31, 2026

Chlorotrimethylsilane → HCID 59633933, compound

https://huagongshe.com/reaction/1615052

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant1,1-DibromoethaneHCID 11201—
ReactantLithium ChlorideHCID 433294—
ReactantTert-butyl 3-iodoazetidine-1-carboxylateHCID 11000522—
ReactantHCID 59634051HCID 59634051—
CatalystZincHCID 23994—
SolventTetrahydrofuranHCID 8028—
SolventHCID 178419050HCID 178419050—
ProductHCID 59633933HCID 59633933—

Reaction Conditions

Temperature70 °C

Reaction Steps

To a suspension of zinc (3.0 g) and lithium chloride (1.5 g) in THF (25 mL) were added dibromoethane (0.30 mL) and chlorotrimethylsilane (0.44 mL) at 70° C. under argon atmosphere. The mixture was stirred at 70° C. for 10 min. A solution of 1-Boc-3-iodoazetidine (9.8 g) in THF (10 mL) was added dropwise to the mixture at RT. The mixture was stirred at RT for 1 hr. To the mixture were added a solution of 1-(4-cyclopropylbenzyloxy)-4-iodo-2-methoxybenzene (5.3 g) prepared in (3) in THF (15 mL) and bis(triphenylphosphine)palladium (II) dichloride (0.49 g). The reaction mixture was stirred at RT for 3 hr. The reaction mixture was quenched with saturated aqueous NH4C1 and extracted with ethyl acetate. The organic layer was dried over MgSO4. The solvent was removed under reduced pressure. The residue was purified by silica-gel chromatography (Developing solvent: hexane/ethyl acetate=9/1 to 4/1) to give the title compound.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08765739B2
Source datasetuspto-grants-2014_07
ORD IDord-4264a397a6c64c33ab8867c63fcb3112
Source noteuspto-grants-2014_07