HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 15463356, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 15463354 | HCID 15463354 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 15463356 | HCID 15463356 | 95% |
Reaction Steps
To a solution of the compound prepared in Example 8 (1.33 g, 2.94 mmol) in DCM (20 ml). was added TFA (20 ml) dropwise. After 19 hours, the reaction was concentrated under reduced pressure, and partitioned between CHCl3 and H2O. The aqueous phase basified with sat. NaHCO3, and the layers were separated. The aqueous phase was extracted with CHCl3. The combined organic layers were washed with H2O, dried over MgSO4 and concentrated under reduced pressure to yield 1.10 g (95%) of a tan solid. 1H-NMR (CDCl3) 2.76 (s, 3H) 5.23 (s, 2H), 7.20-7.60 (m, 8H), 7.93 (d, 2H, J=8.0 Hz)
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06037340 |
| Source dataset | uspto-grants-2000_03 |
| ORD ID | ord-2db774232ea94ef9a653094f593b8494 |
| Source note | uspto-grants-2000_03 |