HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 58002164, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 58002367 | HCID 58002367 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 58002164 | HCID 58002164 | — |
Reaction Steps
425 mg (0.84 mmol) of the compound from Example 177A were initially charged in 55 ml of dichloromethane and, at RT, reacted with 0.65 ml (955 mg, 8.37 mmol) of trifluoroacetic acid. The reaction mixture was stirred at RT for 20 h and then concentrated under reduced pressure. The residue was taken up in ethyl acetate, washed with saturated aqueous sodium bicarbonate solution, dried over sodium sulphate, filtered and concentrated under reduced pressure. Yield: 340 mg (80% of theory, 80% pure)
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US08119663B2 |
| Source dataset | uspto-grants-2012_02 |
| ORD ID | ord-fed8bb2d03454b41b54d279ab7231943 |
| Source note | uspto-grants-2012_02 |