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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1700277Generated: November 2, 2026

Iodoethane → HCID 9933783, compound

https://huagongshe.com/reaction/1700277

Reaction equation

Participants

RoleNameHCIDCharge
ReactantIodoethaneHCID 6340—
ReactantTetrahydrofuranHCID 8028—
ReactantPotassium bis(trimethylsilyl)amideHCID 3251421—
ReactantHCID 22949182HCID 22949182—
SolventTolueneHCID 1140—
ProductHCID 9933783HCID 993378384%

Reaction Steps

A solution of 1.12 mL (0.559 mmol) of 0.5 M potassium bis(trimethylsilyl)amide in toluene was added to a solution of 0.16 g (0.373 mmol) of the product of Example 1 and 0.149 mL (1.86 mmol) iodoethane in 3.5 mL dry THF+0.13 mL (0.746 mmol) HMPA. The reaction was refluxed overnight, quenched with aqueous NH4Cl, extracted 4× with ether, washed 3× with H2O, dried and concentrated in vacuo to an oil. Purification on Analtech 2 mm prep plates, developed in 15% acetone-petroleum ether, afforded 143 mg (84%) of sticky glassy resin. (−)-Electrospray mass spec (M+35 490) was consistent with the structure.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06350763B1
Source datasetuspto-grants-2002_02
ORD IDord-a0f093ea1a35439ab37dee5ea58825dd
Source noteuspto-grants-2002_02