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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1707327Generated: November 1, 2026

Triethylsilane → HCID 9973488, compound

https://huagongshe.com/reaction/1707327

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTriethylsilaneHCID 12052—
ReactantHCID 10055192HCID 10055192—
SolventDichloromethaneHCID 6344—
SolventTrifluoroacetic acidHCID 6422—
ProductHCID 9973488HCID 997348844.2%

Reaction Steps

The product of Step D (0.09 g, 0.14 mmol) was dissolved in 4 mL of 25% trifluoroacetic acid (TFA) in CH2Cl2 at ambient temperature, triethylsilane (0.089 mL, 0.56 mmol) was added and the solution was stirred for 3 h. The reaction mixture was concentrated and partitioned between EtOAc and aqueous saturated NaHCO3 solution. The organic layer was washed with brine and dried (Na2SO4). Filtration, concentration and trituration with hexane provided 0.02 g (44%) of the title compound, mp 69°-73° C.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05352705
Source datasetuspto-grants-1994_10
ORD IDord-bd09be1ffd1a47eba1795ac91e3524b6
Source noteuspto-grants-1994_10