HuagongsheHuagongshe Chemistry Print Report · For research reference only
Benzene → HCID 20510805, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Benzene | HCID 241 | — |
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | Trifluoromethanesulfonic acid | HCID 62406 | — |
| Reactant | HCID 12951084 | HCID 12951084 | — |
| Product | HCID 20510805 | HCID 20510805 | 73.1% |
Reaction Steps
0.92 ml (10 mmol) of benzene was added to a mixture of 6.0 g (6.9 mmol) of di(trifluoroacetoxy)iodoheneicosafluoro-n-decane and 32 ml of trifluoroacetic acid under cooling in an ice bath with stirring, and then 0.61 ml (6.9 mmol) of trifluoromethanesulfonic acid was added dropwise thereto. After completion of the addition, the mixture was stirred for 1.5 hours and the solvent was distilled off to obtain a crystalline solid. The solid was washed with hot chloroform to obtain 4.4 g of heneicosafluoro-n-decylphenyliodonium trifluoromethanesulfonate. Yield, 73%. Melting Point 162°-166° C.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US04371710 |
| Source dataset | uspto-grants-1983_02 |
| ORD ID | ord-19e497c171f14379bc3468eb42d0b3a5 |
| Source note | uspto-grants-1983_02 |