HuagongsheHuagongshe Chemistry Print Report · For research reference only
Methacrylic Acid → HCID 131715949, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Methacrylic Acid | HCID 4093 | — |
| Reactant | Panipenem | HCID 72015 | — |
| Product | HCID 131715949 | HCID 131715949 | — |
Reaction Steps
A 3/1 molar mixture of 3 parts methacrylic acid (MAA) and 1 part PAPM were copolymerized by free radial initiation. This afforded a 3/1 MAA/PAPM photosensitive electrolyte copolymer.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US04833061 |
| Source dataset | uspto-grants-1989_05 |
| ORD ID | ord-0ba8a86ffb9345888b5a594e4c1ff847 |
| Source note | uspto-grants-1989_05 |