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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1768473Generated: November 2, 2026

Trifluoroacetic acid → HCID 10052357, compound

https://huagongshe.com/reaction/1768473

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantTriethylamineHCID 8471—
ReactantMethyl vinyl sulfoneHCID 19354—
ReactantHCID 10098834HCID 10098834—
SolventEthanolHCID 702—
ProductHCID 10052357HCID 10052357—

Reaction Steps

To 40 mg (0.07 mmol) of amine 7-2 in EtOH was added 15 μL (0.11 mmol) of triethylamine and 10 μL (0.11 mmol) of methyl vinyl sulfone. After stirring for 60 min, ˜500 μL of trifluoroacetic acid was added and the mixture was stirred for 1 h. The reaction was partitioned between EtOAc and 15% aqueous Na2CO3, the layers were separated, the organic phase was washed with saturated NaHCO3, water, brine, dried over MgSO4, and concentrated by rotary evaporation. The residue was purified by column chromatography on silica gel with 20:1:1 EtOH/NH4OH/H2O in EtOAc to provide 13-1 as a white solid. Data for 13-1: 1HNMR (500 MHz, CDCl3) δ 7.4-7.2 (m, 5H), 7.1-6.9 (m, 3H), 6.3 (s, 1H), 5.3 (m, 1H), 4.8 (m, 1H), 4.6 (m, 1H), 4.4 (m, 1H), 4.0 (m, 1H), 3.75 (m, 1H), 3.15 (m, 2H), 3.05 (s, 3H), 3.0 (m, 2H), 2.9 (s, 3H), 2.85 (m, 2H), 2.2 (m, 2H), 1.9-1.7 (m, 4H) ppm. HRMS (ES) calc'd M+H for C27H33F2N3O4S1: 534.2233. Found: 534.2218.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS07235580B2
Source datasetuspto-grants-2007_06
ORD IDord-3ee316eeb0254feb8b3d30a5ce343508
Source noteuspto-grants-2007_06