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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1774593Generated: November 1, 2026

Chlorotrimethylsilane → HCID 11063095, compound

https://huagongshe.com/reaction/1774593

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant2-MethylcyclohexanoneHCID 11419—
ReactantLithium diisopropylamideHCID 2724682—
SolventTetrahydrofuranHCID 8028—
ProductHCID 11063095HCID 1106309580.3%

Reaction Conditions

Temperature-78 °C

Reaction Steps

Under nitrogen atmosphere, a solution of 2-methylcyclohexanone (0.5 g, 4.46 mmol) in anhydrous tetrahydrofuran (1 mL) was added dropwise to a solution of lithium diisopropylamide 2.0M in tetrahydrofuran (2.45 mL, 4.90 mmol) in anhydrous tetrahydrofuran (10 mL), previously cooled at −78° C. After stirring for 30 minutes at the same temperature, trimethylsilyl chloride (0.96 mL, 7.58 mmol) was added and the reaction mixture was stirred at room temperature for 1 hour before being quenched with a saturated solution of ammonium chloride (10 mL) at 0° C. Diethyl ether (20 mL) was added and the mixture was allowed to reach room temperature. Layers were separated and the organic layer was dried over sodium sulfate and concentrated in vacuo. The residue was purified by flash chromatography on silica gel (cyclohexane) to provide trimethyl[(6-methylcyclohex-1-en-1-yl)oxy]silane (18a) (660 mg, 3.58 mmol, 80%)

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS09260395B2
Source datasetuspto-grants-2016_02
ORD IDord-9a117a014c3b42e28ec7dd1db2d5cebd
Source noteuspto-grants-2016_02