HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1774593Generated: November 1, 2026
Chlorotrimethylsilane → HCID 11063095, compound
https://huagongshe.com/reaction/1774593
Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | 2-Methylcyclohexanone | HCID 11419 | — |
| Reactant | Lithium diisopropylamide | HCID 2724682 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 11063095 | HCID 11063095 | 80.3% |
Reaction Steps
Under nitrogen atmosphere, a solution of 2-methylcyclohexanone (0.5 g, 4.46 mmol) in anhydrous tetrahydrofuran (1 mL) was added dropwise to a solution of lithium diisopropylamide 2.0M in tetrahydrofuran (2.45 mL, 4.90 mmol) in anhydrous tetrahydrofuran (10 mL), previously cooled at −78° C. After stirring for 30 minutes at the same temperature, trimethylsilyl chloride (0.96 mL, 7.58 mmol) was added and the reaction mixture was stirred at room temperature for 1 hour before being quenched with a saturated solution of ammonium chloride (10 mL) at 0° C. Diethyl ether (20 mL) was added and the mixture was allowed to reach room temperature. Layers were separated and the organic layer was dried over sodium sulfate and concentrated in vacuo. The residue was purified by flash chromatography on silica gel (cyclohexane) to provide trimethyl[(6-methylcyclohex-1-en-1-yl)oxy]silane (18a) (660 mg, 3.58 mmol, 80%)
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US09260395B2 |
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| Source dataset | uspto-grants-2016_02 |
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| ORD ID | ord-9a117a014c3b42e28ec7dd1db2d5cebd |
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| Source note | uspto-grants-2016_02 |
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