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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1787506Generated: November 1, 2026

HCID 11485504, compound → HCID 11416854, compound

https://huagongshe.com/reaction/1787506

Reaction equation

Participants

RoleNameHCIDCharge
ReactantHCID 11485504HCID 11485504—
SolventSulfuric AcidHCID 1118—
SolventTolueneHCID 1140—
ProductHCID 11416854HCID 1141685463%

Reaction Steps

To a solution of the title compound of example 1 (185 mg, 0.5 mmol) in toluene (8 mL), H2SO4 adsorbed on silica gel (Chavetz et al., Synthetic Communications, 24, 2325, 1884) (400 mg) was added portionwise during 4 h at 80° C. Then silica gel was filtered off and the residue was thoroughly washed with acetone. Solvent was removed under reduced pressure and the residue was treated with ice water. The final product precipitated and was isolated by filtration (63% yield).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS07511038B2
Source datasetuspto-grants-2009_03
ORD IDord-a287d7a32ab54dd68fcf030e26ed7db9
Source noteuspto-grants-2009_03