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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1802433Generated: November 1, 2026

Thionyl Chloride → HCID 178489932, compound

https://huagongshe.com/reaction/1802433

Reaction equation

Participants

RoleNameHCIDCharge
ReactantThionyl ChlorideHCID 24386—
ReactantDiisopropylethylamineHCID 81531—
ReactantHCID 59253257HCID 59253257—
ReactantHCID 178489933HCID 178489933—
ProductHCID 178489932HCID 17848993247.2%

Reaction Steps

Activation of 0.46 g (2.23 mmol) of 2-cyclopropylmethanesulfonyl-2-methyl-propionic acid as the corresponding acid chloride is achieved by treatment with thionyl chloride (5 mL, 69 mmol) at 70° C. for 2 h. The reaction is cooled to room temperature and excess thionyl chloride is removed under reduced pressure. The crude acid chloride is dissolved in THF (5 mL) and N,N-diisopropylethylamine (0.54 mL, 5.64 mmol) is added followed by 0.3 g (2.6 mmol) of 5-(3-methoxy-phenyl)-4H-[1,2,4]triazol-3-ylamine. After complete addition the reaction is heated to 70° C. for 36 h. The reaction is cooled to room temperature and the solvent is removed under reduced pressure. The residue is dissolved in DCM (20 mL) and washed with saturated aqueous NaHCO3 solution (20 mL). The aqueous layer is back-extracted with DCM (2×20 mL). The combined organic layers are dried over Na2SO4, filtered and the filtrate is concentrated under reduced pressure. The residue is slurried in DCM/ether (1/1, 10 mL) to yield 0.398 g of 2-cyclopropylmethanesulfonyl-N-[5-(3-methoxy-phenyl)-4H-[1,2,4]triazol-3-yl]-2-methyl-propionamide. Yield: 46%; ES-MS: m/z 379 [M+H]

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08349871B2
Source datasetuspto-grants-2013_01
ORD IDord-b1668838d0dd43e0ad33d8de5737949f
Source noteuspto-grants-2013_01