HRID1803914

反应详情

EQUATION

反应方程式

HRID 1803914 的结构方程式

AUXILIARIES

试剂、催化剂与溶剂

1

PROCEDURE

实验过程

To 4-chloro-N-(3-chlorophenyl)pyrimidin-2-amine, 3, (0.2 g, 0.84 mmol) in THF (4 mL) is added diisopropylethylamine (0.29 mL, 1.67 mmol) followed by 3-morpholino-propylamine (0.245 mL, 1.67 mmol). The resulting mixture was heated to reflux for 6 hours. Another 2 equivalents of 3-morpholinopropylamine (0.245 mL, 1.67 mmol) is added and the reaction heated to reflux and stirred for 18 hours. The resulting mixture is heated to reflux for 18 hours. The reaction is cooled to room temperature and concentrated in vacuo. The residue is diluted with 5 mL water and extracted with EtOAc (3×25 mL). The combined organic layers are dried (MgSO4) and concentrated in vacuo. The residue is diluted with 5 mL water and extracted with EtOAc (3×25 mL). The combined organic layers are dried (MgSO4) and concentrated in vacuo. This residue is purified over silica (6% MeOH in CH2Cl2 with 0.7% Et3N) to afford 0.120 g (41% yield) of the desired compound. 1H NMR (DMSO-d6, 300 MHz): δ 1.68-1.75 (m, 2H), 2.34-2.40 (m, 6H), 3.30-3.35 (m, 2H), 3.55-3.58 (m, 4H), 5.97 (d, J=5.7 Hz, 1H), 6.88 (d, J=7.2 Hz, 1H), 7.19-7.28 (m, 2H), 7.59 (d, J=7.2 Hz, 1H), 7.80 (br s, 1H), 8.13 (br s, 1H), 9.19 (br s, 1H). MS (ESI, pos. ion) m/z: 348 (M+1).

WORKUP

后处理

  1. temperatureThe resulting mixture was heated
  2. temperatureto reflux for 6 hours
  3. temperaturethe reaction heated
  4. temperatureto reflux
  5. temperatureThe resulting mixture is heated
  6. temperatureto reflux for 18 hours
  7. concentrationconcentrated in vacuo
  8. additionThe residue is diluted with 5 mL water
  9. extractionextracted with EtOAc (3×25 mL)
  10. dry with materialThe combined organic layers are dried (MgSO4)
  11. concentrationconcentrated in vacuo
  12. additionThe residue is diluted with 5 mL water
  13. extractionextracted with EtOAc (3×25 mL)
  14. dry with materialThe combined organic layers are dried (MgSO4)
  15. concentrationconcentrated in vacuo
  16. customThis residue is purified over silica (6% MeOH in CH2Cl2 with 0.7% Et3N)