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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1815449Generated: October 29, 2026

Trifluoroacetic acid → HCID 22500564, compound

https://huagongshe.com/reaction/1815449

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantHCID 22500637HCID 22500637—
SolventChloroformHCID 6212—
ProductHCID 22500564HCID 2250056497%

Reaction Steps

To a solution of the product of step c (3.29 g, 7.89 mmol) in CHCl3 (8 ml) was added trifluoroacetic acid (16 ml) and the reaction mixture was stirred at ambient temperature for 20 h. The excess trifluoroacetic acid was removed at reduced pressure and the residue partitioned between aqueous 10% potassium carbonate (50 ml) and CHCl3 (50 ml). The CHCl3 layer was removed and the aqueous phase was extracted with further CHCl3 (50 ml). The combined organic phases were washed with brine and dried over anhydrous sodium sulfate. The filtrate was evaporated at reduced pressure to afford the title compound (2.42 g, 97%). 1H NMR (CHCl3) 8.43 (1H, d, 1.5), 7.98-7.86 (4H, m), 7.76-7.60 (2H, m), 3.20-3.01 (5H, m), 2.60-2.55 (2H, m), 1.60-1.19 (8H, m).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06878736B1
Source datasetuspto-grants-2005_04
ORD IDord-b9d361dd7cd14265a2639d803de7e842
Source noteuspto-grants-2005_04