HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 22500564, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 22500637 | HCID 22500637 | — |
| Solvent | Chloroform | HCID 6212 | — |
| Product | HCID 22500564 | HCID 22500564 | 97% |
Reaction Steps
To a solution of the product of step c (3.29 g, 7.89 mmol) in CHCl3 (8 ml) was added trifluoroacetic acid (16 ml) and the reaction mixture was stirred at ambient temperature for 20 h. The excess trifluoroacetic acid was removed at reduced pressure and the residue partitioned between aqueous 10% potassium carbonate (50 ml) and CHCl3 (50 ml). The CHCl3 layer was removed and the aqueous phase was extracted with further CHCl3 (50 ml). The combined organic phases were washed with brine and dried over anhydrous sodium sulfate. The filtrate was evaporated at reduced pressure to afford the title compound (2.42 g, 97%). 1H NMR (CHCl3) 8.43 (1H, d, 1.5), 7.98-7.86 (4H, m), 7.76-7.60 (2H, m), 3.20-3.01 (5H, m), 2.60-2.55 (2H, m), 1.60-1.19 (8H, m).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06878736B1 |
| Source dataset | uspto-grants-2005_04 |
| ORD ID | ord-b9d361dd7cd14265a2639d803de7e842 |
| Source note | uspto-grants-2005_04 |