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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1864765Generated: October 30, 2026

Chlorotrimethylsilane → HCID 11851783, compound

https://huagongshe.com/reaction/1864765

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantHCID 69021862HCID 69021862—
ReactantButyllithiumHCID 178418339—
SolventTetrahydrofuranHCID 8028—
ProductHCID 11851783HCID 11851783—

Reaction Steps

To a solution of 53 mg (0.100 mmol) 3-7 in 0.75 mL anhydrous THF at −78° C. under N2 was added 60 μL (0.150 mmol) 2.5 M n-BuLi in hexanes dropwise. Immediately following this addition, 51 μL (0.400 mmol) chlorotrimethylsilane was added, the cooling bath was removed, and the reaction warmed to room temperature. After 30 min the reaction was quenched with saturated aqueous NH4Cl solution and partitioned between EtOAc and saturated aqueous NaHCO3 solution. The organic phase was washed with water, brine, dried with Na2SO4 and concentrated. The residue was purified by reverse-phase preparatory HPLC with CH3CN/H2O (with 0.1% TFA). The fractions containing the desired product were poured into saturated aqueous NaHCO3 solution and extracted with EtOAc and concentrated to yield the freebase 3-8 as a clear, colorless oil.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS07625936B2
Source datasetuspto-grants-2009_12
ORD IDord-0ef431f2a4ba4c4584399324a714532a
Source noteuspto-grants-2009_12