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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1898926Generated: November 1, 2026

HCID 15337654, compound → HCID 178428592, compound

https://huagongshe.com/reaction/1898926

Reaction equation

Participants

RoleNameHCIDCharge
ReactantHCID 15337654HCID 15337654—
Reactant2-cyano-3-ethoxyacrylic acid N-cyclopropylmethyl-N-(3-trifluoromethylphenyl)amideHCID 54341639—
Solvent1,2-DimethoxyethaneHCID 8071—
ProductHCID 178428592HCID 17842859247%

Reaction Steps

A solution of 8.2 g of (unpurified, about 90% pure) 2-cyano-3-ethoxyacrylic acid N-isopropyl-N-(3-trifluoromethylphenyl)amide (compound IV: R4 =CH(CH3)2 ; R5, R6 =H; R7 =C2H5) in 20 ml of abs. DME was added dropwise to a suspension of 3.91 g (25 mmol) of 1-amidino-4,4-dimethyl-2-oxoimidazolidine in 16 ml of abs. DME at 20°, and the mixture was stirred at 22°-24° for 4.5 hours. The mixture was then evaporated in vacuo at a maximum bath temperature of 25°. The oily residue was taken up in 250 ml of ether and extracted six times with 25 ml of water each time. The etherial solution was then dried over MgSO4, filtered and evaporated in vacuo (<26°). The residue (12.7 g) was partially crystalline. The latter was taken up in 40 ml of ether, 2 ml of pentane were added, the mixture was left to stand at 4°-6° for 2 days and subsequently the crystals were filtered off with suction. Drying (over P4O10 at 20°-24°, 6-8 mbar, 48 hours) resulted in 5.12 g (=47% yield) of TLC-pure compound II (R1, R2 =CH3 ; R3, R5, R6 =H; R4 =CH(CH3)2), melting point 121°-122° C.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05571816
Source datasetuspto-grants-1996_11
ORD IDord-0033d90bb20048689e8c563b312a1461
Source noteuspto-grants-1996_11