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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1919245Generated: November 3, 2026

Sodium Silicate → Orthosilicic acid

https://huagongshe.com/reaction/1919245

Reaction equation

Participants

RoleNameHCIDCharge
ReactantSodium SilicateHCID 23266—
ReactantSodium orthosilicateHCID 26051—
Reactant1312-76-1HCID 22222942—
ProductOrthosilicic acidHCID 14942—
ProductSodium SilicateHCID 23266—

Reaction Steps

Colloidal silica particles commonly used as polishing particles are made by a wet chemical method, which includes the steps of: preparing a dilute solution of a water glass (e.g., sodium water glass and potassium water glass, which are primarily composed of sodium silicate and potassium silicate, respectively) solution; passing the water glass solution through a cationic exchange resin to remove metallic ions, such as Na+ and K+, from the water glass solution to form an aqueous active silicic acid solution; adding a basic agent to the silicic acid solution for alkalization at appropriate temperature and pH value to conduct polycondensation of active silicic acid to form particles of colloidal silica; and ultra-filtering the particles of colloidal silica to obtain a silica sol. In consideration of safety, operating convenience, and production costs, the alkalization is usually conducted using sodium hydroxide or sodium water glass.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08167684B2
Source datasetuspto-grants-2012_05
ORD IDord-0d58c1691db14888b5e5c52e78fc443e
Source noteuspto-grants-2012_05