Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Sodium Silicate | HCID 23266 | — |
| Reactant | Sodium orthosilicate | HCID 26051 | — |
| Reactant | 1312-76-1 | HCID 22222942 | — |
| Product | Orthosilicic acid | HCID 14942 | — |
| Product | Sodium Silicate | HCID 23266 | — |
Reaction Steps
Colloidal silica particles commonly used as polishing particles are made by a wet chemical method, which includes the steps of: preparing a dilute solution of a water glass (e.g., sodium water glass and potassium water glass, which are primarily composed of sodium silicate and potassium silicate, respectively) solution; passing the water glass solution through a cationic exchange resin to remove metallic ions, such as Na+ and K+, from the water glass solution to form an aqueous active silicic acid solution; adding a basic agent to the silicic acid solution for alkalization at appropriate temperature and pH value to conduct polycondensation of active silicic acid to form particles of colloidal silica; and ultra-filtering the particles of colloidal silica to obtain a silica sol. In consideration of safety, operating convenience, and production costs, the alkalization is usually conducted using sodium hydroxide or sodium water glass.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US08167684B2 |
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| Source dataset | uspto-grants-2012_05 |
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| ORD ID | ord-0d58c1691db14888b5e5c52e78fc443e |
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| Source note | uspto-grants-2012_05 |
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