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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1934505Generated: November 3, 2026

Dimethyl Sulfoxide → HCID 18679596, compound

https://huagongshe.com/reaction/1934505

Reaction equation

Participants

RoleNameHCIDCharge
ReactantDimethyl SulfoxideHCID 679—
ReactantCesium fluorideHCID 25953—
ReactantHCID 13484121HCID 13484121—
ReactantHCID 70171603HCID 70171603—
ProductHCID 18679596HCID 18679596—

Reaction Conditions

Temperature70 °C

Reaction Steps

1-Trimethylsilyloxy-1-(thiophen-3-yl)ethylene (7.0 mmol; prepared according to J. Chem. Soc.,Perkin Trans. I 1989, 1585) and CsF (0.27 g, 1.76 mmol) were added to a suspension 1-(2-hydroxyphenyl)-3-(3,4-methylenedioxythenyl)-2-propen-1-one on Wang resin (2.0 g, 1.76 mmol), in dimethyl sulfoxide (30 mL). The reaction mixture was heated to 70° C. for 3 h and the reaction was quenched with 10% AcOH/CH2Cl2. The resin was filtered, washed with DMF (×2) and alternating MeOH and CH2Cl2 (×5), and dried under high vacuum overnight to give 1-(2-hydroxyphenyl)-3-(3,4-methylenedioxyphenyl)-5-(thiophen-3-yl)-1,5-pentanedione on Wang resin.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06384057B1
Source datasetuspto-grants-2002_05
ORD IDord-68205baa32a1468bad2c37d9b3432e86
Source noteuspto-grants-2002_05