HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1934505Generated: November 3, 2026
Dimethyl Sulfoxide → HCID 18679596, compound
https://huagongshe.com/reaction/1934505
Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Dimethyl Sulfoxide | HCID 679 | — |
| Reactant | Cesium fluoride | HCID 25953 | — |
| Reactant | HCID 13484121 | HCID 13484121 | — |
| Reactant | HCID 70171603 | HCID 70171603 | — |
| Product | HCID 18679596 | HCID 18679596 | — |
Reaction Steps
1-Trimethylsilyloxy-1-(thiophen-3-yl)ethylene (7.0 mmol; prepared according to J. Chem. Soc.,Perkin Trans. I 1989, 1585) and CsF (0.27 g, 1.76 mmol) were added to a suspension 1-(2-hydroxyphenyl)-3-(3,4-methylenedioxythenyl)-2-propen-1-one on Wang resin (2.0 g, 1.76 mmol), in dimethyl sulfoxide (30 mL). The reaction mixture was heated to 70° C. for 3 h and the reaction was quenched with 10% AcOH/CH2Cl2. The resin was filtered, washed with DMF (×2) and alternating MeOH and CH2Cl2 (×5), and dried under high vacuum overnight to give 1-(2-hydroxyphenyl)-3-(3,4-methylenedioxyphenyl)-5-(thiophen-3-yl)-1,5-pentanedione on Wang resin.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|
| Patent number | US06384057B1 |
|---|
| Source dataset | uspto-grants-2002_05 |
|---|
| ORD ID | ord-68205baa32a1468bad2c37d9b3432e86 |
|---|
| Source note | uspto-grants-2002_05 |
|---|