Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Cesium fluoride | HCID 25953 | — |
| Reactant | Trimethyl{[1-(naphthalen-2-yl)ethenyl]oxy}silane | HCID 13451205 | — |
| Reactant | HCID 54335129 | HCID 54335129 | — |
| Solvent | Dimethyl Sulfoxide | HCID 679 | — |
| Product | HCID 18679589 | HCID 18679589 | — |
Reaction Steps
1-Trimethylsilyloxy-1-(naphthalen-2-yl)ethylene (7.0 mmol; prepared according to J. Chem. Soc., Perkin Trans. I 1989, 1585) and CsF (0.27 g, 1.76 mmol) were added to a suspension of 3-(3,4-difluorophenyl)-1-(2-hydroxyphenyl)-2-propen-1-one on Wang resin (2.0 g, 1.76 mmol) in dimethyl sulfoxide (30 mL). The reaction mixture was heated to 70° C. for 3 h and the reaction was quenched with 10% AcOH/CH2Cl2. The resin was filtered, washed with DMF (×2) and alternating MeOH and CH2Cl2 (×5), and dried under high vacuum overnight to give 3-(3,4-difluorophenyl)-1-(2-hydroxyphenyl)-5-(naphthalen-2-yl)-1,5-pentanedione on Wang resin.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US06384058B1 |
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| Source dataset | uspto-grants-2002_05 |
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| ORD ID | ord-a9bc4530a89a477db5ffc503bd417220 |
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| Source note | uspto-grants-2002_05 |
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