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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1934539Generated: October 29, 2026

Cesium fluoride → HCID 18679589, compound

https://huagongshe.com/reaction/1934539

Reaction equation

Participants

RoleNameHCIDCharge
ReactantCesium fluorideHCID 25953—
ReactantTrimethyl{[1-(naphthalen-2-yl)ethenyl]oxy}silaneHCID 13451205—
ReactantHCID 54335129HCID 54335129—
SolventDimethyl SulfoxideHCID 679—
ProductHCID 18679589HCID 18679589—

Reaction Conditions

Temperature70 °C

Reaction Steps

1-Trimethylsilyloxy-1-(naphthalen-2-yl)ethylene (7.0 mol; prepared according to J. Chem. Soc., Perkin Trans. I 1989, 1585) and CsF (0.27 g, 1.76 mmol) were added to a suspension of 3-(3,4-difluorophenyl)-1-(2-hydroxyphenyl)-2-propen-1-one on Wang resin (2.0 g, 1.76 mmol) in dimethyl sulfoxide (30 mL). The reaction mixture was heated to 70° C. for 3 h and the reaction was quenched with 10% AcOR/CH2Cl2. The resin was filtered, washed with DMF (×2) and alternating MeOH and CH2Cl2 (×5), and dried under high vacuum overnight to give 3-(3,4-difluorophenyl)-1-(2-hydroxyphenyl)-5-(naphthalen-2-yl)-1,5-pentanedione on Wang resin.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06384060B1
Source datasetuspto-grants-2002_05
ORD IDord-dc810e89f322459e84899f9c3b2befd7
Source noteuspto-grants-2002_05