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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1949620Generated: November 1, 2026

Trichlorosilane → HCID 87410090, compound

https://huagongshe.com/reaction/1949620

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrichlorosilaneHCID 24811—
ReactantHCID 68659281HCID 68659281—
CatalystHCID 178479807HCID 178479807—
SolventTolueneHCID 1140—
ProductHCID 87410090HCID 87410090—

Reaction Conditions

Temperature60 °C

Reaction Steps

Excess HSiCl3 (0.09 mL, 8.609×10−4 mol) and a few grains of dicyclopentadienylplatinum(II) chloride (Cp2PtCl2) catalyst were added in a glove box to a solution of Compound 4 (0.050 g, 8.609×10−5 mol) in about 10 mL anhydrous toluene. The solution was transferred to a Schlenk line where it was heated to 60° C. with stirring and left under static N2 to prevent evaporation of the HSiCl3. The reaction progress was monitored by 1H NMR, and cooled to room temperature after 42 h. Toluene and excess HSiCl3 were next removed in vacuo. Upon trituration of the crude product with 15 mL of a dry 1:1 toluene:pentane solution, a solid formed and was removed via cannula filtration.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08399761B2
Source datasetuspto-grants-2013_03
ORD IDord-4975d87f281e428a984769fd4c37af49
Source noteuspto-grants-2013_03