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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1967852Generated: November 1, 2026

HCID 23144410, compound → HCID 23144526, compound

https://huagongshe.com/reaction/1967852

Reaction equation

Participants

RoleNameHCIDCharge
ReactantHCID 23144410HCID 23144410—
SolventTrifluoroacetic acidHCID 6422—
ProductHCID 23144526HCID 2314452686.1%

Reaction Steps

Compound 623 (550 mg, 1.50 mmol) was dissolved in trifluoroacetic acid (2 mL), followed by stirring for 1 hour. The reaction mixture was concentrated under reduced pressure, and saturated sodium hydrogencarbonate was added to the resulting residue, followed by extraction with ethyl acetate. The organic layer was washed with a saturated aqueous solution of sodium chloride and dried over anhydrous magnesium sulfate, and then the solvent was distilled away under reduced pressure. The resulting residue was purified through silica gel column chromatography (ethyl acetate) to afford the entitled Compound 624 (344 mg, 86%).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08420827B2
Source datasetuspto-grants-2013_04
ORD IDord-a248174f740e42b59fe38ebac3d76274
Source noteuspto-grants-2013_04