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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2059718Generated: November 3, 2026

Trifluoroacetic acid → HCID 44538323, compound

https://huagongshe.com/reaction/2059718

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantSodium HydroxideHCID 14798—
ReactantHCID 86635261HCID 86635261—
SolventDichloromethaneHCID 6344—
ProductHCID 44538323HCID 44538323—

Reaction Steps

A solution of the product from Example 2C (51 mg, 0.115 mmol) in dichloromethane (2 mL) was treated with trifluoroacetic acid (0.18 mL) at ambient temperature and stirred for 16 hours. The mixture was diluted with dichloromethane (20 mL) and basified with sodium hydroxide (1 N). The organic layer was separated, dried with magnesium sulfate, and concentrated under reduced pressure. The resulting residue was chromatographed on a silica gel column eluting with ammonium hydroxide/methanol/dichloromethane (0.8/8/92) to provide the title product: 1H NMR (CD3OD) δ 1.10-1.22 (m, 1H), 1.25-1.36 (m, 1H), 1.42-1.55 (m, 1H), 1.56-1.68 (m, 2H), 1.78-1.90 (m, 1H), 1.95-2.07 (m, 2H), 2.11-2.31 (m, 2H), 2.48 (t, 2H), 2.55-2.60 (m, 3H), 2.98-3.09 (m, 3H), 3.49-3.56 (m, 1H), 3.65-3.77 (m, 2H), 3.80-3.91 (m, 2H), 4.68-4.75 (m, 1H); MS (DCl/NH3) m/z 342 (M+H)+.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08278311B2
Source datasetuspto-grants-2012_10
ORD IDord-597dc84fa17d40bab1d257394d4d24c2
Source noteuspto-grants-2012_10