HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2059718Generated: November 3, 2026
Trifluoroacetic acid → HCID 44538323, compound
https://huagongshe.com/reaction/2059718
Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | Sodium Hydroxide | HCID 14798 | — |
| Reactant | HCID 86635261 | HCID 86635261 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 44538323 | HCID 44538323 | — |
Reaction Steps
A solution of the product from Example 2C (51 mg, 0.115 mmol) in dichloromethane (2 mL) was treated with trifluoroacetic acid (0.18 mL) at ambient temperature and stirred for 16 hours. The mixture was diluted with dichloromethane (20 mL) and basified with sodium hydroxide (1 N). The organic layer was separated, dried with magnesium sulfate, and concentrated under reduced pressure. The resulting residue was chromatographed on a silica gel column eluting with ammonium hydroxide/methanol/dichloromethane (0.8/8/92) to provide the title product: 1H NMR (CD3OD) δ 1.10-1.22 (m, 1H), 1.25-1.36 (m, 1H), 1.42-1.55 (m, 1H), 1.56-1.68 (m, 2H), 1.78-1.90 (m, 1H), 1.95-2.07 (m, 2H), 2.11-2.31 (m, 2H), 2.48 (t, 2H), 2.55-2.60 (m, 3H), 2.98-3.09 (m, 3H), 3.49-3.56 (m, 1H), 3.65-3.77 (m, 2H), 3.80-3.91 (m, 2H), 4.68-4.75 (m, 1H); MS (DCl/NH3) m/z 342 (M+H)+.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|
| Patent number | US08278311B2 |
|---|
| Source dataset | uspto-grants-2012_10 |
|---|
| ORD ID | ord-597dc84fa17d40bab1d257394d4d24c2 |
|---|
| Source note | uspto-grants-2012_10 |
|---|