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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2059720Generated: November 1, 2026

Trifluoroacetic acid → HCID 44538420, compound

https://huagongshe.com/reaction/2059720

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantSodium HydroxideHCID 14798—
ReactantHCID 86635262HCID 86635262—
SolventDichloromethaneHCID 6344—
ProductHCID 44538420HCID 44538420—

Reaction Steps

A solution of the product from Example 7A (28 mg, 0.065 mmol) in dichloromethane (2 mL) was treated with trifluoroacetic acid (0.2 mL) at ambient temperature and stirred for 16 hours. The mixture was diluted with dichloromethane (20 mL), and basified with sodium hydroxide (1 N). The organic layer was separated, dried with magnesium sulfate, and concentrated under reduced pressure. The resulting residue was chromatographed on a silica gel column eluting with ammonium hydroxide/methanol/dichloromethane (0.8/8/92) to provide the dehydrogenated material as the major product and title compound: 1H NMR (CD3OD) δ 1.00-1.18 (m, 1H), 1.27-1.41 (m, 1H), 1.45-1.58 (m, 1H), 1.62-1.75 (m, 2H), 1.92-2.07 (m, 3H), 2.11-2.24 (m, 1H), 2.24-2.39 (m, 2H), 3.38-3.52 (m, 1H), 3.74-3.92 (m, 2H), 3.98-4.12 (m, 1H), 4.10-4.24 (m, 2H), 6.87 (d, 1H), 8.08 (d, 1H); MS (DCl/NH3) m/z 326 (M+H)+.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08278311B2
Source datasetuspto-grants-2012_10
ORD IDord-f93ed6591b19456693c12cddfaecf403
Source noteuspto-grants-2012_10