(p-Hydroxyphenyl)diphenylsulfonium trifluoromethanesulfonate → Benzoic acid-2,2-difluoro-2-sulfo-ethyl ester diphenyl-4-hydroxyphenylsulfonium salt

HRID 2061303노트

반응식

HRID 2061303 반응식
FC(F)(F)S([O-])(=O)=O.[C:9]1([S+:15]([C:23]2[CH:28]=[CH:27][CH:26]=[CH:25][CH:24]=2)[C:16]2[CH:21]=[CH:20][C:19]([OH:22])=[CH:18][CH:17]=2)[CH:14]=[CH:13][CH:12]=[CH:11][CH:10]=1.[Na].[F:30][C:31]([F:46])([S:42]([OH:45])(=[O:44])=[O:43])[CH2:32][O:33][C:34](=[O:41])[C:35]1[CH:40]=[CH:39][CH:38]=[CH:37][CH:36]=1>O>[C:9]1([S+:15]([C:23]2[CH:28]=[CH:27][CH:26]=[CH:25][CH:24]=2)[C:16]2[CH:21]=[CH:20][C:19]([OH:22])=[CH:18][CH:17]=2)[CH:14]=[CH:13][CH:12]=[CH:11][CH:10]=1.[F:46][C:31]([F:30])([S:42]([OH:45])(=[O:44])=[O:43])[CH2:32][O:33][C:34](=[O:41])[C:35]1[CH:40]=[CH:39][CH:38]=[CH:37][CH:36]=1

참가 물질

4

실험 절차

About 6 g of the diphenyl-4-hydroxyphenylsulfonium trifluoromethanesulfonate salt manufactured in the synthesis example 3 and about 4.84 g of a benzoic acid-2,2-difluoro-2-sulfo-ethyl ester sodium salt were dissolved in about 100 ml of an MC and about 100 ml of water, and a synthesis reaction (see Equation 9 below) was performed while strongly stirring for about three hours. In this instance, a process of the synthesis reaction was observed by 19F NMR using a small amount of an extracted organic phase. The organic phase was extracted when the synthesis reaction was terminated, and washed using the MC of a soluble solvent and hexane of a sparingly soluble solvent. Next, the solvents were removed, and drying under a reduced pressure was performed to obtain about 4.3 g (a yield: about 56.4%) of a benzoic acid-2,2-difluoro-2-sulfo-ethyl ester diphenyl-4-hydroxyphenylsulfonium salt, and a structure of the benzoic acid-2,2-difluoro-2-sulfo-ethyl ester diphenyl-4-hydroxyphenylsulfonium salt was observed by 1H-NMR (see FIG. 8):

후처리

  1. customa synthesis reaction (see Equation 9 below)
  2. customIn this instance, a process of the synthesis reaction
  3. extractionThe organic phase was extracted when
  4. customthe synthesis reaction
  5. customwas terminated
  6. washwashed
  7. customNext, the solvents were removed
  8. customdrying under a reduced pressure

출처 및 근거

ORD 기록
ord-9744f832b15d4811b24d42a015fcb37a
출처 데이터셋
uspto-grants-2012_10
특허 번호
US08283102B2

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