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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2070080Generated: November 1, 2026

Propanal → HCID 178459257, compound

https://huagongshe.com/reaction/2070080

Reaction equation

Participants

RoleNameHCIDCharge
ReactantPropanalHCID 527—
ReactantTriethylsilaneHCID 12052—
Reactantbismuth(III) bromideHCID 82232—
ReactantHCID 178472501HCID 178472501—
SolventAcetonitrileHCID 6342—
ProductHCID 178459257HCID 178459257—

Reaction Steps

Propionaldehyde (6.4 g) in acetonitrile (50 mL) was added over 30 minutes to a solution of cis/trans ethyl 4-{[(1,1-dimethylethyl)(dimethyl)silyl]oxy}cyclohexanecarboxylate (D1, 25.2 g), bismuth tribromide (4.4 g) and triethylsilane (17.5 mL) in acetonitrile (300 mL) and the mixture was stirred for a further 1.5 hours. The solvent was partially removed then the residue was treated with ethyl acetate and saturated sodium bicarbonate solution. The organic layer was separated, washed with brine, dried with anhydrous sodium sulphate and the solvent was removed to give the title compounds contaminated with silicone residues (39.1 g).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08299257B2
Source datasetuspto-grants-2012_10
ORD IDord-0491cbd8d71b4926b659d12a7ea62be7
Source noteuspto-grants-2012_10