Back
HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2073819Generated: November 2, 2026

Chlorotrimethylsilane → HCID 14774099, compound

https://huagongshe.com/reaction/2073819

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantDiisopropylamineHCID 7912—
ReactantLithium diisopropylamideHCID 2724682—
Reactant4,4-Dimethyl-2-(2,4,5-trifluorophenyl)-4,5-dihydro-1,3-oxazoleHCID 11009734—
ReactantButyllithiumHCID 178418339—
SolventWaterHCID 962—
SolventTetrahydrofuranHCID 8028—
ProductHCID 14774099HCID 1477409983.1%

Reaction Conditions

Temperature-78 °C

Reaction Steps

A solution of 8.7 ml (62.1 mmol) of diisopropylamine in 100 ml of dry THF under argon was cooled to -78° C. and treated with 28.3 ml (56.6 mmol) of 2.0M n-butyllithium. The LDA solution was stirred at -78° C. for 15 minutes. To this solution was added a solution of 11.8 g (51.5 mmol) of 2-(2,4,5-trifluorophenyl)-4,4-dimethyl-2-oxazoline in 50 ml of THF, and the reaction mixture was stirred for one hour at -78° C. To the reaction mixture was added 13 ml (102.5 mmol) of chlorotrimethylsilane, and the solution was warmed to room temperature. Water was added; the organic layer was dried over magnesium sulfate and concentrated. The crude product was chromatographed on silica gel (E. Merck 230-400 Mesh), eluting with 80:20 chloroform:ethyl acetate to give 12.9 g of the title compound, mp 71°-72° C.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS04920120
Source datasetuspto-grants-1990_04
ORD IDord-41f8b95ddabe44c497e519919f4c0c7c
Source noteuspto-grants-1990_04