Tetraethoxysilane → HCID 131730584, compound

HRID 2093269Notes

Reaction equation

HRID 2093269 reaction equation
[OH:1][C:2]1[CH:3]=[C:4]([CH:7]=[CH:8][C:9]=1O)[CH:5]=[O:6].C([O:13][Si:14](OCC)(OCC)OCC)C>C1(C)C=CC=CC=1>[C:5](=[C:4]1[CH:7]=[CH:8][CH:9]=[C:2]([O-:1])[CH:3]1[O-:13])=[O:6].[Si+4:14].[C:5](=[C:4]1[CH:7]=[CH:8][CH:9]=[C:2]([O-:1])[CH:3]1[O-:13])=[O:6]

Participants

4

Conditions

Temperature
100 °C

Procedure

A solution of 3,4-dihydroxybenzaldehyde (27.6 g, 200 mmol) and toluene (220 mL) was dehydrated by distilling 5 mL of the solution. Thereafter, 20.8 g (100 mmol) of tetraethoxysilane (TEOS) was added to the solution while stirring. The mixed solution was refluxed for 1 hour, and then, while the distillation temperature was 100° C. or higher, distilled until the amount of the solution became half. After the distillation, solid content of the product was isolated by suction filtering using a membrane suction filter. The residual solid content was heated to 100° C. under vacuum using a vacuum dryer so that remaining volatile components were completely removed. The solid content (3,4-dihydroxybenzaldehyde-silicon complex) was black in color. The yield amount was 30.0 g (100 mmol), and the yield percentage was 100%. 15 g of 3,4-dihydroxybenzaldehyde-silicon complex was dissolved into 100 mL of 1:9 dimethylsulfoxide/ethanol to produce a coating liquid.

Workup

  1. distillationby distilling 5 mL of the solution
  2. temperatureThe mixed solution was refluxed for 1 hour
  3. customwas 100° C.
  4. distillationhigher, distilled until the amount of the solution
  5. distillationAfter the distillation, solid content of the product
  6. customwas isolated by suction
  7. filtrationfiltering
  8. filtrationfilter
  9. customwere completely removed
  10. dissolution15 g of 3,4-dihydroxybenzaldehyde-silicon complex was dissolved into 100 mL of 1:9 dimethylsulfoxide/ethanol
  11. customto produce a coating liquid

Sources & evidence

ORD record
ord-2ce2ee875e8642029c311c9dbb01999e
Source dataset
uspto-grants-2013_05
Patent number
US08445118B2

Reaction notes

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