HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 178483697, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | Trifluoromethanesulfonic acid | HCID 62406 | — |
| Reactant | Trimethylsilyl triflate | HCID 65367 | — |
| Reactant | 1,1-Dichloro-N,N,N',N'-tetramethylmethanediamine | HCID 12544745 | — |
| Product | HCID 178483697 | HCID 178483697 | 98.7% |
Reaction Steps
0.5 g (2.92 mmol) of bis(dimethylamino)dichloromethane are added at room temperature to 0.86 g (3.87 mmol) of trimethylsilyl trifluoromethanesulfonate, prepared by reaction of 0.42 g of trimethylchlorosilane with 0.58 g of trifluoromethanesulfonic acid at room temperature. The reaction mixture is stirred for 5 minutes, and all volatile products are subsequently removed under reduced pressure. The residue is dried under reduced pressure at 7 Pa and 50° C., giving 0.82 g of bis(dimethylamino)chlorocarbenium trifluoromethanesulfonate, corresponding to a yield of 98.7%.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US07439395B2 |
| Source dataset | uspto-grants-2008_10 |
| ORD ID | ord-565c45c40dfb4e9c9cb3e7d8fc540983 |
| Source note | uspto-grants-2008_10 |