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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2184732Generated: October 30, 2026

4-Chlorophenyl Isocyanate → HCID 59894917, compound

https://huagongshe.com/reaction/2184732

Reaction equation

Participants

RoleNameHCIDCharge
Reactant4-Chlorophenyl IsocyanateHCID 7693—
ReactantTriphenylphosphineHCID 11776—
Reactantethyl N-ethoxycarbonyliminocarbamateHCID 220568—
ReactantHCID 70109626HCID 70109626—
SolventDichloromethaneHCID 6344—
SolventTetrahydrofuranHCID 8028—
ProductHCID 59894917HCID 5989491712%

Reaction Steps

Wang resin (100-200 mesh, 0.66 mmol/g, 70 mg) was treated with triphenylphosphine (34.5 mg), diethyl azodicarboxylate (20.8 μL) and 3-({(2R)-2-[(fluoren-9-ylmethoxy)carbonylamino]-2-(methoxycarbonyl)ethylthio}methyl)-4-oxo-4-(3-pyridyl)butanoic acid (72.3 mg) in THF (0.5 mL) at room temperature for 3 days. The resin was filtered, washed with dimethyl formamide, isopropanol, dichloromethane and ether and dried. The resin was treated with 20% piperidine-dichloromethane (1 mL) solution for 1 h. The resin was filtered, and washed with dimethyl formamide, isopropanol, dichloromethane and ether and dried. The resin was treated with 10 eq of 4-chlorophenyl isocyanate in dichloromethane (6 mL) for two days. The resin was washed with washed with dimethyl formamide, isopropanol, dichloromethane and ether and dried. The resin was treated with 20% trifluoroacetic acid in dichloromethane (5 mL). The solution was filtered, concentrated and purified on HPLC (C-18 prep column, 10% to 90% acetonitrile in water both containing 0.1% TFA) to give 12% of the title compound; ESMS, (M+1)+480.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06399606B1
Source datasetuspto-grants-2002_06
ORD IDord-3302f233223043b3bc114abd564ed614
Source noteuspto-grants-2002_06