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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2200204Generated: October 31, 2026

Trifluoroacetic acid → HCID 118223417, compound

https://huagongshe.com/reaction/2200204

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantHCID 118223399HCID 118223399—
SolventDichloromethaneHCID 6344—
ProductHCID 118223417HCID 11822341789.4%

Reaction Steps

Dissolve the compound obtained in Step 1 (230 mg, 0.33 mmol) in DCM (15 mL), add trifluoroacetic acid (400 mg), stir at room temperature for 2 hrs. Remove the volatiles, partition the residue in EtOAc and saturated NaHCO3 solution, and separate the organic layer, dry over anhydrous Na2SO4. Concentrate under reduced pressure to give the crude product. Purification by chromatography (silica gel, EtOAc:PE=3:1) affords the title compound (173 mg, 88.3%). MS: (M+1): 588.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS09359338B2
Source datasetuspto-grants-2016_06
ORD IDord-7f6769ac5d184a429609dd82f88790d9
Source noteuspto-grants-2016_06